A wide range of applications Over more than a decade sp3
has developed and applied hot-filament CVD technology to cutting tools and
other mechanical uses, now expanding into a rapidly widening field of
electronic applications based on diamond-on-silicon deposition.
 The Model 250 CVD Reactor
is designed for users who want to take advantage of sp3's excellent hot
filament chamber and filament array design in conjunction with their own
process development and control schemes.
The Model 250 will provide highly uniform diamond films
over a span of 200mm within the 250mm by 250mm deposition area. Applications
include films with variable grain size, micro-crystalline diamond, and
nano-crystalline diamond.
Typical uses of the Model 250 are:
- MEMS
- SAW devices
- Heat spreaders
- Wear coatings
- Electrodes
- Cutting tools
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Highly uniform films can be deposited on silicon
wafers up to 200mm.
The colored fringes indicate a ±5%
uniformity of the deposited diamond film on this 100mm wafer. |
