Superior Coatings for Production and R&D
 The Model 650 CVD
Diamond Deposition System combines proven hot-filament thermal reactor
technology with advanced controls to produce superior polycrystalline diamond
coatings. A multi-step (up to 58 discrete steps), recipe-driven controller
ensures repeatable coatings with optimum characteristics in production, as well
as a high degree of flexibility for developing coatings.
The proprietary
(patented) filament assembly generates uniform energy distribution, operating
at filament temperatures up to 2550°C and power levels up to 20W/cm².
The deposition process is controlled by thermal management of both filament and
substrate temperatures, in conjunction with closed-loop pressure and gas flow
control. Substrate temperatures are measured by thermocouples below the
substrates. Filament temperature is measured with a fixed-position, 2-color
pyrometer.
The
gas distribution assembly allows control of the gas flow patterns in and around
both the filament assembly and the substrates to optimize deposition rates, as
well as coating uniformity and quality. Adequate space is provided in the
deposition chamber to avoid undesirable gas recombination at the chamber
walls.
Changes in
process step parameters and step times can be utilized to alter nucleation
density, growth rate, grain size, and other characteristics to produce coatings
with markedly different morphology (see photos opposite). Small-grain coatings
can be produced for finish applications or wear surfaces. Large-grain, thick
coatings can be produced for rough cutting or long-life tool applications. No
hardware or software modifications are required to switch from one type of
coating to another, merely the selection of a different recipe.
Each process can be
tailored to provide the optimum coating for a given application, and this
coating can be reproduced again and again. Precise computer control of the
deposition process enables the Model 650 to be used very effectively in both
R&D and production applications.
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