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Model 650 Diamond Deposition ReactorApplications |
Diamond depositionCVD applications semiconductor wafers in sizes up to 300mm, silicon substrates for thermal management, amorphous silicon deposition for solar cells and other products, titanium electrodes for water treatment and electrochemistry, MEMS, photonic, microelectronic and nanocrystalline devices, passivation layers for semiconductor chucks, flat panel displays, windows for X-ray lithogaphy, and slab diamond production. |
![]() This RAMAN spectrograph demonstrates the purity of the diamond film produced by the Model 650 CVD Reactor Click here for larger image |
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Cutting toolshigh throughput at low cost |
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Semiconductor wafers |
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Titanium elecrodes |
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MEMS devices |
![]() MEMS structure built from sp3 diamond-on-silicon wafer. Photo courtesy of UC Berkeley. |
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Wear surfaces |
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Overview
Reactor
Description![]()
Deposition Control
Film Uniformity
Specifications