sp3: Model 600 CVD reactor

Model 650 CVD Diamond Deposition System

Description


The Model 650 Deposition System incorporates a supervisory computer, housed in the base cabinet. Complete control of process recipes and deposition runs is provided via a touch-screen display. The sophistication of the supervisory software provides exceptional flexibility in applying the Model 650 to research studies as well as to production runs. Fixturing options are available for common applications of the Model 650.


The Model 650 is easy to use A Graphical User Interface (GUI) enables the operator to quickly view the system process status. All process parameters—temperature, pressure and gas flow values—can be seen at a glance. Highlighted parameters together with audible and visual indicators quickly alert the operator to alarm or abort conditions, permitting prompt response. The touch-screen display provides easy access to menus and primary operational control functions. More involved engineering and maintenance functions are accessed via dedicated menus in a Windows format. A Control Screen enables manual control of process variables for authorized personnel.


		Fast creation and editing of process recipes A Recipe Manager facilitates creation of new process recipes and quick, easy editing of existing recipes. Recipes with up to 58 discrete process steps can be created. Parametric control of all process variables is achieved through assignment of applicable setpoints and digital inputs at each process step. Limits can be programmed to initiate alarm and abort commands on all process parameters. Recipes can be stored within production and engineering folders, with multi-level access control via a tiered security system. Remote recipe management is provided by a stand-alone application and remote computer/network connection via an Ethernet port.


Complete process run histories can be maintained Run process data is recorded at user-programmable intervals to assist with process development, routine maintenance and troubleshooting tasks. This data is logged to yield a permanent record for future reference. All key process parameters, digital I/O states and events for the current recipe are easily viewed through the data display. A separate event log makes it convenient to view a summary of run step changes for an entire process run. In addition, a stand-alone data viewer affords review and export of process data history files.


		Real-time control of process variables The process control module permits real-time control of all key process variables. In addition to assuring run-to-run repeatability in a production mode, this facilitates process development and optimization of variables to achieve performance objectives. Programmable alarm and abort levels can be set to prevent deviation outside of set limits and thereby prevent material scrap. Hardware safety features and interlocks protect the equipment and operating personnel.


Fixturing options Option packages available are: Planar array package — for flat substrates which require a coating on one planar surface. Silicon wafer package — for coating wafers: 100mm, 150mm, 200mm, 300mm. Substrate cooling package — for controlling backside wafer temperature. Three-dimensional array package — for applications and substrates which require coating in more than one plane. Flat cutting tool package — for use on all tungsten carbide inserts, grooving tools, engravers,etc. Round cutting tool package — for coating drills, endmills, countersinks, routers and other rotating tungsten carbide tools.

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OverviewApplicationsDeposition ControlFilm UniformitySpecifications		The Model 650 Deposition System information provided on the website may also be viewed and printed as a 4-page brochure, using Acrobat Reader: "View quality" file (approx. 113 KB) "Print quality" file (approx 2.3 MB) Download Adobe Acrobat Reader

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