Model 650 CVD Diamond Deposition System

Overview

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Model 650 Hot-Filament Diamond Deposition System
  • Computer-controlled deposition—consistent film thickness and grain size for production; flexible control of deposition for R&D
  • Large usable deposition area—350mm by 375mm (14 in. by 15 in. )
  • Excellent film uniformity— ±10% over entire deposition area
  • High production capacity—large chamber size combined with fast turnaround and >95% uptime
  • Filament spacing easily configured to suit coating application—optional fixturing for 2D and 3D coating
  • Low cost operation—less than 0.4 kwh power consumption per cubic mm of diamond deposited
  • Safe—no operator exposure to aromatic hydrocarbons; personnel and equipment protected by hardware and software interlocks
  • Reliable—MTBF greater than 500 hours
  • Proprietary technology—protected by U.S patents no. 5,833,753, 5,997,650, 6,063,149, 6,319,610 and 6,533,831

Reactor DescriptionApplications Diamond Properties		 Model 650 Reactor
The Model 650 Deposition System's integrated process controller provides precise and repeatable deposition in both production and R&D applications. The controller is accessed via the touch-screen display seen in this photo.

Reactor Availability

The sp3 Model 650 CVD Deposition System is distributed worldwide by Seki Technotron, Tokyo, Japan.
Processes, procedures, training, installation, and maintenance support are all provided by sp3 as part of the purchase of a Model 650 System.

  

Technology Availability

sp3 offers the opportunity to license its chemical vapor deposition
and diamond tool coating technologies.

For further information please call sp3 at:
(408) 492-0630 or (877) 773-9940, or
e-mail.
  For more information please contact:
Seki Technotron USA
2220 Martin Avenue, CA 95050-2704
(888) 273-6225; (408) 986-9190
fax (408) 986-9191; e-mail.
Or visit www.sekicvdsolutions.com